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Corgi Lithography & Semiconductor Photonics ETF

23.95

+0.42001.78%

盤後：23.42-0.5333-2.23%19:57 EDT

成交量：38.68萬

成交額：928.33萬

市值：4.30億

市盈率：- -

高：24.24

開：23.96

低：23.73

收：23.53

52周最高：32.00

52周最低：20.61

股本：1,794.50萬

流通股本：1,794.50萬

量比：0.67

換手率：2.16%

股息：- -

股息率：- -

淨資產收益率：--

總資產收益率：--

市淨率：--

市盈率(LYR):- -

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新聞

SK海力士目標2028年將High NA EUV技術用於DRAM內存量產

三星與ASML合作開發下一代EUV光刻掩模版

據首爾經濟日報，三星電子將與全球最大的光刻設備製造商ASML共同開發高數值孔徑（High-NA）極紫外（EUV）光刻技術

英特爾晶圓代工與阿斯麥深化合作，推動High-NA EUV用於更大尺寸AI芯片

TradingKey中文

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