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Corgi Lithography & Semiconductor Photonics ETF
23.95
+0.4200
1.78%
盤後:
23.42
-0.5333
-2.23%
19:57 EDT
成交量:
38.68萬
成交額:
928.33萬
市值:
4.26億
市盈率:
- -
高:
24.24
開:
23.96
低:
23.73
收:
23.53
52周最高:
32.00
52周最低:
20.61
股本:
1,780.00萬
流通股本:
1,780.00萬
量比:
0.67
換手率:
2.17%
股息:
- -
股息率:
- -
淨資產收益率:
--
總資產收益率:
--
市淨率:
--
市盈率(LYR):
- -
資料載入中...
總覽
公司
新聞
公告
SK海力士目標2028年將High NA EUV技術用於DRAM內存量產
IT之家
·
09/11
三星與ASML合作開發下一代EUV光刻掩模版
格隆汇
·
09/09
據首爾經濟日報,三星電子將與全球最大的光刻設備製造商ASML共同開發高數值孔徑(High-NA)極紫外(EUV)光刻技術
智通财经
·
09/09
英特爾晶圓代工與阿斯麥深化合作,推動High-NA EUV用於更大尺寸AI芯片
TradingKey中文
·
09/08
瑞銀:中國未來十年內難開發可媲美阿斯麥頂尖 EUV 光刻設備,DUV 量產或需兩至五年
链捕手
·
09/02
三星電子計劃在1nm級製程節點實現High NA EUV商業應用
格隆汇
·
08/12
三星計劃 2030 年 1 納米工藝導入 High-NA EUV 技術
链捕手
·
08/11
SK海力士據報推進EUV工藝 引入新材料PSM
格隆汇
·
08/11
SK海力士正致力於推進其極紫外光刻(EUV)技術,以實現下一代DRAM的量產。公司於去年首次推出高數值孔徑(High-N
智通财经
·
08/11
消息稱三星暫緩High-NA EUV技術量產,因財務考量而非技術瓶頸
IT之家
·
07/17
24小時環球政經要聞 | 7月16日
格隆汇
·
07/16
這家初創公司一天內推出了35只ETF——而且沒有放緩的打算
路透中文
·
06/22
韓國簡化極紫外光刻機進口審批流程
环球市场播报
·
06/02
韓國簡化極紫外光刻機進口程序,以支持芯片產業發展
环球市场播报
·
06/02
英特格(ENTG)與JSR Corporation聯合宣佈就EUV光刻技術達成非獨家交叉許可協議
金吾财讯
·
05/27
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15:03","pubTimestamp":1788851034,"startTime":"0","endTime":"0","summary":"TradingKey - 英特尔(INTC)晶圆代工业务正与阿斯麦(ASML)进一步深化High-NA EUV合作。阿斯麦最新表示,将与包括英特尔、英伟达(NVDA)、台积电(TSM)和三星电子在内的主要芯片企业合作,开发更大尺寸光掩模,以推动下一代High-NA EUV设备用于大型AI和数据中心芯片制造。","market":"nz","thumbnail":"https://resource.tradingkey.com/cms_uploads/img/20240102/c0531811fe341e7a5268ef210c462723.jpg","type":0,"news_type":0,"thumbnails":["https://resource.tradingkey.com/cms_uploads/img/20240102/c0531811fe341e7a5268ef210c462723.jpg"],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.tradingkey.com/zh-hans/analysis/stocks/us-stock/262155438-intel-foundry-asml-deepen-collaboration-promote-high-na-euv-larger-ai-chips-tradingkey","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"0","news_top_title":null,"news_tag":"corporation","news_rank":0,"length":0,"strategy_id":0,"source":null,"symbols":["AIS","GPTZ","EPAI","AVGX","ALAI","LRNZ","AIVC","TWSC","XNTK","SHOC","AVGC","AIBU","TSMZ","EUV","TSMU","SOXM","AMUU","AMDC","ARMH","WISE","GFSG","UMCX","FAI","TSEU","XSEM","INTW","SEMY","INT","BGIA","AMDL","TTEQ","SMHC","AIQ","SINTCmain","TMYY","03191","CHPX","TSMG","TSXU","TSEG","TSMX","INTC","AMDG","CNAV","QQQA","TSMY","FTXL","AIFD","LEGR","LINT"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2664860323","title":"瑞銀:中國未來十年內難開發可媲美阿斯麥頂尖 EUV 光刻設備,DUV 量產或需兩至五年","url":"https://stock-news.laohu8.com/highlight/detail?id=2664860323","media":"链捕手","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2664860323?lang=zh_tw&edition=fundamental","pubTime":"2026-09-02 09:16","pubTimestamp":1788311804,"startTime":"0","endTime":"0","summary":" ChainCatcher 消息,据彭博社报道,瑞银集团分析师预计,未来十年内中国半导体制造能力可能难以取得足够快的进展,从而开发出能够真正替代阿斯麦尖端 EUV 光刻技术的方案。瑞银分析师在报告中写道,“他们目前所处的阶段似乎与阿斯麦在 2004 年时相当”,从专利申请活动来看,尤其是在光源和激光子系统领域,中国当前技术成熟度大致相当于阿斯麦开始大规模生产 EUV 设备前 15 年的水平。\n\n瑞银同时预计,中国有望在未来两到五年内具备浸没式 DUV 光刻机的大规模量产能力。浸没式 DUV 虽不如 EUV 先进,但仍是芯片制造不可或缺的设备。阿斯麦浸没式 DUV 售价近 9000 万美元,EUV 设备每台超 2 亿美元。中国是阿斯麦最大市场之一,但受出口限制,阿斯麦被禁止向中国出售 EUV 设备。瑞银指出,考虑到良率和产能差距及监管限制,中国光刻设备不太可能在境外得到应用。阿斯麦发言人对置评请求未作回应。该报道基于瑞银分析师的预测观点,实际进展以产业动态为准。 ","market":"nz","thumbnail":null,"type":0,"news_type":0,"thumbnails":[],"rights":null,"property":[],"language":"zh","translate_title":"","themeId":null,"theme_name":"","theme_type":"","isJumpTheme":false,"source_url":"https://www.chaincatcher.com/article/2286995","is_publish_highlight":false,"source_rank":0,"column":"","sentiment":"-1","news_top_title":null,"news_tag":"","news_rank":0,"length":0,"strategy_id":0,"source":null,"symbols":["EUV","BGIA"],"isVideo":false,"video":null,"gpt_icon":0},{"id":"2658944014","title":"三星電子計劃在1nm級製程節點實現High NA EUV商業應用","url":"https://stock-news.laohu8.com/highlight/detail?id=2658944014","media":"格隆汇","labels":[],"top":-1,"itemType":null,"share":"https://ttm.financial/m/news/2658944014?lang=zh_tw&edition=fundamental","pubTime":"2026-08-12 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14:30","pubTimestamp":1786429812,"startTime":"0","endTime":"0","summary":" ChainCatcher 消息,三星电子半导体研究所 Foundry 工艺开发团队朴昌民在“2026 下一代光刻+图案化学术大会”上表示,公司计划从 1 纳米(A10)工艺开始应用 High-NA EUV 技术,目标在 2030 年左右实现量产。三星目前在 2 纳米及以下工艺中仍采用现有 0.33 NA EUV 的多重图案化方案,计划 2029 年量产 1.4 纳米,后续再推进至 1 纳米。\n\nHigh-NA EUV 将透镜数值孔径(NA)从 0.33 提升至 0.55,分辨率更高,可将原先需多重图案化的超微细工艺简化为单次图案化,有利于降低制造成本、提升生产效率和设计灵活性。但该技术难度高、设备昂贵,且需要配套材料技术同步升级。朴昌民预计 1.4 纳米和 1 纳米工艺仍以 0.33 NA EUV 多重图案化为主流,此后 High-NA 图案化将成为新一代工艺的核心技术。 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